基于UG蓝宝石晶片刷洗机结构设计
摘要：蓝宝石晶片是近几年里发展比较迅猛的一种新型材料，因为它的结构独特，耐磨，耐划且硬度仅次于金刚石，与此同时，它还具有良好的化学稳定性能，力学机械性能，透光性好，电气绝缘性好等，因此它在LED，医疗，国防，航空，电子技术等领域应用的十分广泛。
蓝宝石晶片的应用如此广泛且随着我国科技的快速发展，对于蓝宝石晶片的表面加工质量要求也越来越高，因此对蓝宝石晶片清洗也成为了行业里必不可少的。以前传统的蓝宝石晶片的清洗方法是人工刷洗，效率比较低员工工作量大，且伴随着很多不确定因素，很容易磕坏晶片的边缘。
现如今，我国很多公司企业专门针对于蓝宝石晶体表面的清洗设计生产出蓝宝石晶片刷洗机，其中，大多都是超声波清洗或兆声波清洗，这虽大大减少了晶片的加工成本，提高了效率，且降低了人工对于晶体表面的伤害。但是对于残留在晶片表面的一些顽固污渍还是无法彻底清除。
本设计为了针对此问题，在刷洗机结构中加入了毛刷刷洗晶片表面的部分。因此将结构分为前进组件，旋转组件，喷淋组件，刷洗组件，气动门组件五大部分。前进组件是通过丝杠螺母和滑轨的相互配合运动来带动整个转盘的前后移动；旋转组件是通过电机带动同步带和同步轮，控制转盘的旋转；刷洗组件是通过电机带动毛刷旋转清洗晶片表面；喷淋组件是对转盘表面进行药液和纯水的喷淋；气动门组件是通过回转气缸和连杆结构的自动化来实现开门和关门。之后利用UG12.0对五大部分进行零件的建模与装配，并对其进行运动仿真。
关键字：蓝宝石晶片刷洗机结构设计；建模与装配；运动仿真
Design of Sapphire Wafer Scrubbing Machine(I) Mechanical Design
Abstract:Sapphire chip is a new material with rapid development in recent years. Because of its unique structure, wear resistance, scratch resistance and hardness second only to diamond, at the same time, it also has good chemical stability, mechanical properties, good light transmittance and good electrical insulation. Therefore, it is widely used in LED, medical treatment, national defense, aviation, electronic technology and other fields.
Sapphire chips are widely used, and with the rapid development of science and technology in China, the requirements for the surface processing quality of sapphire chips are becoming higher and higher. Therefore, the cleaning of sapphire chips has become an essential part of the industry. In the past, the traditional cleaning method of sapphire wafer was manual brushing, which was inefficient, heavy workload of employees, and accompanied by many uncertain factors, it was easy to break the edge of the wafer.
Nowadays, many companies and enterprises in China design and produce sapphire wafer cleaning machines specifically for the cleaning of sapphire crystal surface, most of which are ultrasonic cleaning or megasonic cleaning, which greatly reduces the processing cost of the wafer, improves the efficiency, and reduces the damage to the surface of artificial crystal. However, some stubborn stains left on the surface of the wafer can not be completely removed.
In order to solve this problem, a brush is added to the structure of the brushing machine to brush the surface of the wafer. Therefore, the structure is divided into five parts: forward component, rotating component, spraying component, brushing component and pneumatic door component. The forward component drives the forward and backward movement of the whole turntable through the cooperative movement of the lead screw nut and the slide rail; The rotating component drives the synchronous belt and synchronous wheel through the motor to control the rotation of the rotary table; The brush component drives the brush to rotate through the motor to clean the wafer surface; Spray the surface of the rotary table with pure water; The pneumatic door assembly realizes door opening and closing through the automation of rotary cylinder and connecting rod structure. Then use ug12 0 for the five parts of the three-dimensional modeling and assembly, and dynamic simulation.
key word：Design of sapphire wafer scrubbing machine; Modeling and assembly; Motion simulation
目录
第一章 绪论 4
1.1 课题的意义 4
1.2 课题研究内容 5
1.3 本章小结 5
第二章 前进组件结构设计 6
2.1 丝杠滑轨选型 6
2.2 前进组件建模 8
2.3 前进组件装配 14
2.4 前进组件仿真 15
2.5 本章小结 20
第三章 旋转组件结构设计 21
3.1 转盘设计 21
3.2 旋转组件建模 23
3.3 旋转组件装配 33
3.4 旋转组件仿真 34
3.5 本章小结 36
第四章 刷洗组件结构设计 36
4.1 刷洗组件建模 37
4.2 刷洗组件装配 46
4.3 刷洗组件仿真 48
4.4本章小结 50
第五章 喷淋组件结构设计 51
5.1 喷嘴选型 51
5.2 喷淋组件建模 52
5.3 喷淋组件装配 59
5.4喷淋组件仿真 60
5.5本章小结 60
第六章 气动门组件结构设计 61
6.1气动气缸选型 61
6.2气动门组件建模 62
6.3气动门组件装配 69
6.4气动门组件仿真 70
6.5本章小结 74
第七章 总结 75
致谢 76
参考文献 77
附录 78
参考文献
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附录
附录1蓝宝石晶片刷洗机造型图纸
附录2 蓝宝石晶片刷洗机的三维建模与装配
附录3蓝宝石晶片刷洗机的仿真录屏
